Karl SUSS MicroTec MA6 , Mask Aligner

Mask Aligner SUSS MicroTec MA6 - UV lithography system

Equipment:

UV exposure at 365 nm,

Backlight unit with NIR camera,

Wafer chucks (transmitted light), mask holder,

Accessories:

LCPLAN FL 20x/0.40 lens,

LMPLFLN 20x/0.40 lens,

11.25x0.16 lens (separation),

Optometer without sensor with case,

Mask holder MA6/BA6/BL/Cont/M-3,

Mask holder MA6/BA6/BL/Prox/Cont, Sola-Check accessories,

Chuck MA6/BA6/VAC/TEFFLON/W-100/S.