Alcatel SCM 600 Magnetron Sputtering System

Alcatel SCM 600 Magnetron Sputtering System

Technical Specifications:

Process: Physical Vapor Deposition (PVD) via Magnetron Sputtering.

Chamber & Loading: Semi-automatic load-lock system for sample introduction.

Power Sources: Equipped with 3 power generators (2x RF 13.56 MHz and 1x DC).

Substrate Capability: Compatible with 4-inch or 6-inch wafers/substrates.

Configuration: 4-target capacity.

Versatility: RF power can be coupled to either the target or the substrate.

Vacuum System: Includes 3 primary pumps and a cryogenic pump.

Included: Main electrical cabinet and control units.

Condition:

Functional Frame: The mechanical and vacuum components of the system are functional.

USED, IN GOOD VISUAL CONDITION, NOT TESTED.

Packing and preparation for shipment available upon request.