Nextral NE 550 – Advanced RIE System with Laser End-Point Detection

Nextral NE 550 – Advanced RIE System with Laser End-Point Detection

Key Technical Specifications:

Chamber & Cathode: Features a large 43 cm diameter cathode covered with a high-purity quartz plate.

Power System: 1200W RF Generator (13.56 MHz) with automatic impedance matching (Auto Load & Tune).

Anode: Located on the chamber lid (grounded) and serves as the reactive gas injection system.

Cooling System: Cathode and turbo pump are cooled via a dedicated chiller using specialized coolant (Galden type).

Vacuum System: * Turbo-molecular pump for high vacuum.

Primary backing pump integrated into the frame (utilizing Alcatel AL 300 oil).

Automatic pressure and gas regulation.

Advanced Features & Control:

End-Point Detection: Equipped with a Laser Diode (677.3 nm) for real-time etching depth monitoring and precise process termination.

Software Control: Operated via PC with NAPS software, allowing for full parameter management, recipe creation, and real-time process tracking on screen.

Condition & Logistics:

Status: Complete system with all integrated subsystems (chiller, pumps, control PC).

USED, IN GOOD VISUAL CONDITION, NOT TESTED.

Packing and preparation for shipment available upon request.